Gear-Ratio-Aware Standard Cell Layout Framework for DTCO Exploration
Chung‐Kuan Cheng, Andrew B. Kahng, Bill Lin, Yucheng Wang, Dooseok Yoon · 2023
With advances in lithography technology, the minimum metal pitch (MP) becomes smaller than the contacted poly pitch (CPP). This difference has long prompted the need to seek an optimal ratio between CPP and MP. Automated cell synthesis with conditional design rules offers a valuable lever to speed up the technology exploration process and to identify the best "gear ratio" (GR) for Design-Technology Co-optimization (DTCO) exploration.