20.2: Invited Paper: Fast and Robust High Precision Luminance Image Stitching in Uniformity and DeMURA measurements
Ingo Rotscholl, Bob Liu, Udo Krüger · SID Symposium Digest of Technical Papers · 2023
This paper provides an overview of image stitching and its general advantages and challenges. Further, we introduce a novel stitching concept based on our advanced pixel registration (APR) procedure. It allows easy and comparable flexible stitching setups for DeMURA and uniformity measurements in laboratory and production environments.