Implementation of a Packed Data Format for Production of Computer Generated Holograms by E-beam Lithography
Daniel M. Newman, Robert W. Hawley, Neal C. Gallagher · 1992
Electron beam lithography has become the method of choice for producing computer generated holograms. The demand for these high quality diffractive optics has made their fabrication much more than a research interest. Unfortunately, the electron beam machines themselves have not kept pace with the demand for this new application. The pattern data formats used with these machines were developed with the VLSI industry in mind. As a result they are not well suited for exposing the arbitrary fringe patterns found in many computer generated holograms.