Conference of Microelectronic Research 1990
Eric M. Apelgren, James Baccaro, Jeffrey Ballak, Brian Barker, Mark A. Boehm, Michael Buczkowski, John Coniff, James Constantino, Robert W. Crandall, Theodore D’Antonoli, David DeMuynck, Joseph P. De Santis, Hung Q. Doan, Jennifer A. Dunbar, Gregg D. Espin, Kurt Gerber, W. Groß, William G. Hamilton, Russell W Heller, Karl D. Hirschman · RIT Scholar Works (Rochester Institute of Technology) · 1990
A phase shifting mask, to be used for the purpose of improving the resolution of a proiection lithography system, was fabricated.This type of mask consists of line-space pairs in which every other aperture induces a 180 degree phase shift in the transmitted radiation.In order to obtain this phase shift there must be a thickness difference between the apertures.Etching of the glass mask plate in 3:100 HF to DI water wa.s used to obtain the required • etch depth.