The efficient DTCO Compact Modeling Solutions to Improve MHC and Reduce TAT
Yo-Han Kim, Udit Monga, Jungmin Lee, Minkyoung Kim, Jaesung Park, Chanho Yoo, Kyungjin Jung, Sungduk Hong, Sung Jin Kim, Dae Sin Kim, Ho-Kyu Kang · 2018
This paper introduces the recent modeling challenges of the Process Development Kit (PDK) development due to the limitations of transistor scaling and the impact of new process technologies. And a new modeling solution, Agile PDK is presented to break though these development challenges by enabling the Design Technology Co-Optimization (DTCO) activities in the manufacturing levels. A series of advanced algorithms are newly introduced to not only reduce the PDK development time (TAT), but also improve the model accuracies and Model-to-Hardware Correlation (MHC). It is applied to the latest DRAM technology and dramatically reduces the development TAT up to 50% with improved model accuracies.