Anomaly detection through on-line isolation Forest: An application to plasma etching
Gian Antonio Susto, Alessandro Beghi, Seán McLoone · 2017
Advanced Monitoring Systems are fundamental in advanced manufacturing for control, quality and maintenance purposes. Nowadays, with the increasing availability of data in production and equipment, the need for high-dimensional Anomaly Detection techniques is thriving; anomalies are data patterns that have different data characteristics from normal production instances and that may be associated with faults or drifts in production. Tools for dealing with high-dimensional monitoring problems are provided by Machine Learning: in this paper, we test the performance of a state-of-the-art anomaly detection technique, called Isolation Forest, on a real industrial dataset related to Etching, one of the most important semiconductor manufacturing process. The monitoring has been performed exploiting Optical Spectroscopy Data.