THE I-V CHARACTERISTICS OF SILVER THIN FILM ON THE RANDOM FRACTAL SUBSTRATE
WANG JING-SONG, Gaoxiang Ye, XU YU-QING, Qirui Zhang · Acta Physica Sinica · 1994
摘要 在无规分形结构的α氧化铝陶瓷断面上，用射频溅射法镀制了银薄膜，其Ｉ－Ｖ特性在空气中呈非线性行为，而在原位真空测量中表现为开关形式的电压击穿效应。基于衬底的结构特性，作者对上述现象作了合理的解释。 Abstract The silver thin films were deposited on the substrates of the α-alumina ceramic which possess a random fractal structure. The I-V characteristics of such films exhi bit nonlinear behavior in air and a switching type voltage breakdown effect by in situ measurement in vacuum. Based on the structure geometry of the substrate, we explaine these phenomena with the developed Random Tunnelling Junction Network model. 作者及机构信息 王劲松1, 叶高翔2, 许宇庆1, 张其瑞1 (1)浙江大学物理系; (2)浙江大学物理系,杭州大学物理系 Authors and contacts WANG JING-SONG1, YE GAO-XIANG2, XU YU-QING1, ZHANG QI-RUI1 (1)浙江大学物理系; (2)浙江大学物理系,杭州大学物理系 参考文献 施引文献