The development of microelectronic apparatus technology (MAT) is characterized by the parallel development of nondestructive technological process control methods since more com- plex materials and processes impose rigid demands on measurement reliability and accuracy.
Anatoliy P. Dostanko, A. V. Tishkevich · 1991
in the solution of practical control problems [i]. However, the calibration characteristics of these devices are constructed in the presence of noise and, therefore, can be estimated only by statistical methods. An additive mixture u(t) of signal s(t) and noise n(t) acts at the OETMS output u(t)=s(t)+.(t). Construction of the calibration characteristic reduces to performing N independent measurements of the mixture u i of the signal and noise, averaging of the samples obtained, and finding the function T* = F(ui), 1 _< i -< N, where T* is the measured temperature. It is here assumed that the mathematical expectation and variance of the noise n(t) and its samples n i respectively equal M{n(t)}=o: M{n,}=0; (l) D(n(t)}=Di D{ni}=M{n~} =D, while the higher moments of the noise distribution equal zero,