Design of a File Format for E-beam Lithography and Its Application
Han Li · Microfabrication Technology · 2005
Based on the Objected-oriented ideas, a new file format was designed for the E-beam lithography, especially for the vector type machine·With the use of this format the format con- version was more precise and convenient, as well as, the data transformation was more efficient·The format,named as EDF, has been applied to the project of Nano-electron Beam Lithography System·