The challenges and limitations on triple level cell geometry and process beyond 20 nm NAND Flash technology
Yunbong Lee, Byoung-Jun Park, Dae-Hwan Yun, YeonJoo Jeong, Pyoung Hwa Kim, Ji Yul Park, Hae chang Yang, Myoung Kwan Cho, Kun-Ok Ahn, Yo-Hwan Koh · 2010
This paper investigates the challenges and difficulties of TLC cell geometry and process beyond 20nm NAND technology from the viewpoint of programmed Vthlevel, new HCI disturbance and charge loss in the highest programmed level.