Rapid failure analysis using contamination-defect-fault (CDF) simulation
Jitendra B. Khare, Wojciech P. Maly · IEEE Transactions on Semiconductor Manufacturing · 1996
This paper describes a new methodology for rapid failure analysis. The methodology is based on the contamination defect-fault (CDF) simulator CODEF, which is able to map the effects of contamination deposited on an IC cell during any stage of the manufacturing process, onto circuit-level faults. The utilization of CODEF's capabilities-in both single contamination mode and Monte Carlo mode-in speeding up failure analysis is illustrated in the paper with examples.