Electron beam lithography and liftoff of molecules and DNA rafts
Gary H. Bernstein, Walter W. Hu, Qingling Hang, Koshala Sarveswaran, Marya Lieberman · 2005
Electron beam lithography patterning of polymethylmethacrylate (PMMA) is a versatile tool for defining molecular structures on the sub-10 nm scale. We demonstrate lithographic resolution to about 5 nm using a cold development technique. Narrow trenches are used to pattern Creutz-Taube molecules with resolution to about 15 nm. In addition, DNA rafts are patterned with high fidelity at linewidths of about 100 nm. This technique can be applied to molecular patterning in general, and quantum-dot cellular automata (QCA) in particular.