Recent progress in quantum and nonlinear optical lithography
Robert W. Boyd, Sean J. Bentley · Journal of Modern Optics · 2006
We review the status of the field of quantum lithography, that is, the use of quantum-mechanical effects to write lithographic features with resolution finer than that achievable according to the Rayleigh criterion. In particular, we first review the original quantum lithography proposal by Boto et al., and we then describe the status of research aimed at realizing this process.