Fabrication and characterization of IC-processed brightness enhancement films
Liwei Lin, T.K. Skia, Chun-Jung Chiu · 2002
IC-processed brightness enhancement films have been successfully fabricated and characterized. A process which combines anisotropic silicon etching and plastic molding has been used to fabricate high quality, large area (four inches in diameter) transparent films. These films have thickness of about 150 /spl mu/m with fine micro pyramids (30 /spl mu/m base width and 20 /spl mu/m in height) on top. By placing these films on top of a backlight, optical tests show that up to 20% brightness enhancement in the front viewing angle of about /spl plusmn/35/spl deg/ can be achieved. Potential applications are devices with LCD displays in laptop computers, personal TVs and camcorders.