A line extraction method for automated SEM inspection of VLSI resist
D.B. Shu, C.C. Li, J.F. Mancuso, Yue Sun · IEEE Transactions on Pattern Analysis and Machine Intelligence · 1988
A precision digital edge-line-detection method is presented that was developed for extracting edge contours of resist lines of submicrometer width as imaged by scanning electron microscopy, as a means of inspection in integrated circuit fabrication. The method is based on a modification of the Hough transform.>