Chip-scale 3D topography synthesis
Mariusz Niewczas, Xiaolei Li, Andrzej J. Strojwas, Wojciech P. Maly · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1998
We propose a novel approach to perform the chip scale mask to topography mapping by building a library of repetitive mask patterns. We call them vicinity patterns. They describe a collection of mask features in close proximity. This pattern library is used to synthesize 3-D topography of an arbitrary part of the chip topography. We define some process-related parameters, which we call critical interaction lengths, as a basis for mask decomposition into the vicinity patterns.