Hierarchical Patterns: Harnessing Localized Ridges for High‐Aspect‐Ratio Hierarchical Patterns with Dynamic Tunability and Multifunctionality (Adv. Mater. 11/2014)
Changyong Chase Cao, Hon Fai Chan, Jianfeng Zang, Kam W. Leong, Xuanhe Zhao · Advanced Materials · 2014
A simple yet effective method, described on page 1763 by X. Zhao and co-workers, to generate high-aspect-ratio, hierarchical, and dynamically tunable topographical patterns over large areas by harnessing the localized-ridge instability in nanofilms. The new patterns have led to extraordinary functions, including extremely stretchable super-hydrophobic coatings and biomimetic cell-culture substrates capable of controlled stem-cell alignment on demand.