The principle of a new thermometer in HF CVD reactor
Magdaléna Kadlěčíková, M. Kolmačka, F. Lazišťan, Juraj Breza, Karol Jesenák, K. Pastorková, Daniela Ďuračková · 2009
The topic of the submitted article is the issue of measuring the temperature in a hot filament chemical vapour deposition (HF CVD) reactor by a purpose-built electronic circuit. The topical objective is to optimize the substrate temperature, one of the key technological parameters in the synthesis of carbon nanotubes. Design and construction of a functional thermometer and its calibration and, hereby, improved accuracy of temperature measurement is the main outcome of this experimental work.