Electron beam techniques for magnetic bubble device fabrication
R.A. Harris, W. Clegg, R. M. Pickard, S.F. Gourley, C.J. Hardy · Radio and Electronic Engineer · 1973
By using the electron beam machine to expose an electron sensitive resist and then by use of the 'float-off technique it is possible to produce the necessary permalloy overlay patterns for bubble devices with micron linewidths. Specification of the pattern is by computer program. At higher powers, the electron beam can also be used to damage the bubble material. This damage can be used to constrain the bubble motion.