A new technique for gettering oxygen and moisture from gases used in semiconductor processing
J. R. Shealy, J. M. Woodall · Applied Physics Letters · 1982
A technique for the removal of small amounts of water vapor and oxygen from hydrogen and nitrogen is described in which the gas is purified by bubbling it through a gallium-indium- aluminum melt at room temperature. Using this technique, dew points of ⩽−80 °C are achieved when the starting gas contains as much as one part per thousand of water vapor.