Quantum Lithography beyond the Diffraction Limit via Rabi Oscillations
Zeyang Liao, M. Al-Amri, Muhammad Suhail Zubairy · Physical Review Letters · 2010
We propose a quantum optical method to do the subwavelength lithography. Our method is similar to the traditional lithography but adding a critical step before dissociating the chemical bound of the photoresist. The subwavelength pattern is achieved by inducing the multi-Rabi oscillation between the two atomic levels. The proposed method does not require multiphoton absorption and the entanglement of photons. It is expected to be realizable using current technology.