Simulation of the image reversal submicron process in integrated circuit fabrication
Ioannis G. Karafyllidis, Adonios Thanailakis · Semiconductor Science and Technology · 1996
An algorithm for the simulation of the image reversal process based on Cellular Automata is presented for the first time. The development resist profiles produced by this algorithm are of the same geometry and shape as those obtained by experiments. Furthermore, the dependence of the slope of a resist-line-edge on the bake time has also been successfully reproduced using this algorithm.