Projection lithography by means of parametric photon pairs
Naoki Fukutake · Journal of Modern Optics · 2006
It is well known that entangled-photon pairs generated by spontaneous parametric down-conversion exhibit a property that is analogous to that of ordinary incoherent lights. We formulate an image-forming optical theory of quantum lithography that comprehends the both conceptions of partial coherence and partial entanglement by extending a classical image-forming optical theory. Our optical system consists of an image-forming system, an illumination system with a second-order nonlinear medium, and two-photon absorbing materials. We evaluate the resolution of the quantum lithography system by using the optical transfer function and show a special case to be a super-resolving system.