Implantation Process for Removing a Reflection Inside a Circuit
Harold E. Stinehelfer · 1987
This paper wi1l describe the use of implanting a theoretical reflection inside an experimental measurement to remove a junction capacitance. Time domain analysis will be used to examine what is happening inside the circuit using the frequency domain representation for the "Implant". The implant process is performed on a set of measurements to allow more detailed examination of the circuit. The theoretical circuit can be capacitive, inductive or an impedance change at a given location. This technique can allow the measured date to be experimentally changed. The procees is less expensive and faster than making physical tuning changes.