A complete Process Design Kit verification flow and platform for 28nm technology and beyond
Yanfeng Li, Miao Li, Waisum Wong · 2012
Process Design Kit (PDK) is becoming extremely complex in order to address variability from different sources such as layout-dependent effects at 28nm node and beyond. The increasing importance of layout parasitic also brings more complexity into PDK verifications. This paper reports and demonstrates a verification flow and platform to qualify the advanced PDKs with focus on addressing layout-dependent effects and layout parasitic. This platform is successfully being applied for 28nm technology. Test structures and methodologies of verifying layout-dependent components and parasitic extractions are presented.