Quantum-interferometric optical lithography: Towards arbitrary two-dimensional patterns
Pieter Kok, Agedi N. Boto, Daniel S. Abrams, Colin P. Williams, Samuel L. Braunstein, Jonathan P. Dowling · Physical Review A · 2001
As demonstrated by Boto et al. [Phys. Rev. Lett. 85, 2733 (2000)], quantum lithography offers an increase in resolution below the diffraction limit. Here, we generalize this procedure in order to create patterns in one and two dimensions. This renders quantum lithography a potentially useful tool in nanotechnology.