A new approach for 2-D mesh generation for complex device structures
Gilda Garretón, L. Villablanca, Norbert Strecker, Wolf Fïchtner · 2002
Mesh generation has become one of the most important steps in technology CAD (TCAD). The ever increasing complexity of modern semiconductor devices together with certain restrictions on the grid parameters (non-obtuse angles, desirable aspect ratios, etc.) put stringent requirements on the performance of mesh generators. This paper formulates new aspects to consider in the mesh generation process. >