A Method Of Two-Terminal Excess Noise Measurement With A Reduction Of Measurement System And Contact Noise
Arkadiusz Szewczyk · AIP conference proceedings · 2005
The method and the system for excess noise measurement of electrical two‐terminal components with the significant reduction of the system and contact noise influence is presented. The proposed method can be applied for noise measurements either on devices with terminals or on the wafer level, where as a reference noise the noise of resistive structure fabricated directly on the wafer in the vicinity of the tested component can be used.